| Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/ ULSI Applications Contributor(s): Schmitz, John E. J. (Author) |
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ISBN: 0815512880 ISBN-13: 9780815512882 Publisher: William Andrew OUR PRICE: $72.22 Product Type: Hardcover - Other Formats Published: December 1992 Annotation: This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments and applications are described. |
| Additional Information |
| BISAC Categories: - Computers | Logic Design - Technology & Engineering | Electronics - Circuits - Integrated - Technology & Engineering | Electronics - Circuits - Vlsi & Ulsi |
| Dewey: 621.395 |
| LCCN: 91018643 |
| Series: Materials Science and Process Technology |
| Physical Information: 0.72" H x 6.16" W x 9.26" (1.05 lbs) 251 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described. |